Zero liquid discharge recycling system for PCB FAB, general metal finishing, and chemical milling

ABSTRACT

A method, system and composition is described for treating waste generated from manufacturing operations including at least one of Printed Circuit Boards Fabrication (PCB FAB), General Metal Finishing (GMF), semiconductors manufacturing, chemical milling, and Physical Vapour Deposition (PVD). The method, system and composition are used to create zero liquid discharge recycling.

REFERENCE TO PRIOR APPLICATIONS

This application claims the benefit of prior application Ser. No.17/120,124, filed Dec. 12, 2020, and incorporates by reference thisprior application in its entirety.

FIELD OF THE INVENTION

Embodiments described herein in general, concern methods and systems fora zero liquid discharge recycling system. More particularly, theembodiments concern methods and systems for zero liquid dischargerecycling of waste generated from manufacturing operations involvingPrinted Circuit Boards Fabrication (PCB FAB), General Metal Finishing(GMF), semiconductor manufacturing (SEMICON), chemical milling, andPhysical Vapor Deposition (PVD) manufacturing.

BACKGROUND

Unless otherwise indicated herein, the approaches described in thissection are not prior art to the claims in this application and are notadmitted to be prior art by inclusion in this section.

With the increasing development across the globe, the problem of waterpollution has emerged as a major public interest concern. The collectivewaste generated by the public and commercial industries constitutes aserious public health crisis. Between the two, industrial waste presentsthe greatest danger to the public's health and if disposed directly intosoil or water poses a significant threat to the quality of soil and/oraquatic life. In view of this crisis and the public's increasedawareness, different methodologies have been adopted to tackle theseissues.

The concept of industrial waste treatment has historically facedignorance and denials. The waste contains complex chemical compoundswhich require adequate treatments to neutralize or minimize thepoisonous impacts of these chemicals on the environment. Municipal levelsewage treatment plants have been widely adopted to treat theseindustrial wastes. Such treatment plants utilize bacteria which helpswith the biological decomposition of the industrial waste. In addition,wastewater treatments for manufacturing operations in the aboveindustries rely on the use of reverse osmosis and ion exchangetechnologies to purify city water (or other water sources) as well as torecycle dilute rinse waters. These approaches achieve a recycling levelof 0-90 percent. The ion exchange regeneration chemicals and otherchemical cleaning solutions are subsequently batch treated along withother concentrated water streams to remove regulated metals. Inaddition, further processing to remove regulated organics is required,if they exist, prior to discharging the treated materials into a sewerpipe. This approach is considered a public owned treatment works (POTW).

However, this approach has significant limitations. For example, if thedischarged water exceeds drinking water contamination standards, thewater requires further treatment prior to release into the environment.Finally, POTW facilities are highly regulated which can have a negativeimpact on the business.

It is apparent that a need exists for a better waste management systemthat overcomes the many above described disadvantages.

SUMMARY OF THE INVENTION

According to one embodiment, a zero liquid discharge recycling methodfor treating waste generated from manufacturing operations is provided.The manufacturing operations include at least one of Printed CircuitBoards Fabrication (PCB FAB), General Metal Finishing (GMF),semiconductors manufacturing, chemical milling, and Physical VaporDeposition (PVD) manufacturing. In one embodiment, the waste includesrinse-water waste, concentrate waste, and film and mask developer waste.The zero liquid discharge recycling method includes treating therinse-water waste in an ion exchange feed tank, a first granularactivated carbon (GAC) column, a copper selective ion exchange column, amembrane-based separation module, and an advanced oxidation process(AOP) tank to generate an ultra-pure water output. In anotherembodiment, the method further includes treating the concentrate wastein a chemical dewatering reactor to generate a first part of a solidwaste output. In another embodiment, the output of the chemicaldewatering reactor and the film and mask developer waste are treated ina distillation feed tank, a thermal vacuum dewatering tank, and acrystallization tank to generate a distilled water output to be treatedalong with the rinse-water waste, and a second and third part of thesolid waste output.

In one embodiment, treating the rinse-water waste in the ion exchangefeed tank comprises feeding the rinse-water waste from the manufacturingoperations into the ion exchange feed tank and exposing the rinse-waterwaste to ultraviolet light within the ion exchange feed tank.

In another embodiment, the suspended solids are removed from an outputof the ion exchange tank using a centrifugal filter and bag filters with10 μm meshes.

In another embodiment, treating the rinse-water waste in the firstgranular activated carbon (GAC) column includes feeding the output ofthe ion exchange feed tank, after the removal of the suspended solids,into the first granular activated carbon (GAC) column. The non-polarorganic compounds, halogens, and water-insoluble substances are alsoremoved from the output of the ion exchange feed tank.

In another embodiment, treating the rinse-water waste in the copperselective ion exchange column comprises feeding an output of the firstgranular activated carbon (GAC) column into the copper selective ionexchange column and binding copper ions present in the output of thefirst granular activated carbon (GAC) column by a copper selective ionexchanger within the copper selective ion exchange column. In anotherembodiment, the method further includes feeding an output of the copperselective ion exchange column into a low conductivity water tank andexposing the output of the copper selective ion exchange column toultraviolet light within the low conductivity water tank.

In one embodiment, treating the rinse-water waste in the membrane-basedseparation module includes feeding an output of the low conductivitywater tank into a first reverse osmosis (RO) module. The output of thelow conductivity water tank is separated into an RO1 permeate and an RO1reject within the first RO module. In another embodiment, the RO1permeate is fed into a second RO module, and is separated into an RO2permeate and an RO2 reject within the second RO module. The RO2 rejectis circulated to the first RO module to be treated along with the outputof the low conductivity water tank. In another embodiment, the RO2permeate is fed into an electrodeionization (EDI) module. The RO2permeate is separated into an EDI permeate and two streams of EDI rejectwithin the EDI module. In another embodiment, the RO1 reject is fed intoa third RO module. The RO1 reject is separated into RO3 permeate and RO3reject within the third RO module. The RO3 permeate is circulated to theion exchange feed tank. The RO3 reject is fed into nanofiltration (NF)module, which separates the RO3 reject into NF permeate and NF reject.When conductivity in the ion exchange feed tank is below a predeterminedthreshold the NF reject is circulated from the NF module to the ionexchange feed tank, and when the conductivity in the ion exchange feedtank exceeds the predetermined threshold the NF reject is fed from theNF module into the concentrate waste tank.

In another embodiment, treating the rinse-water waste in the advancedoxidation process (AOP) tank includes feeding the EDI permeate into theAOP tank via a deionized (DI) water tank and exposing the EDI permeateto ozone and ultraviolet light within the AOP tank. In one embodiment,the output of the AOP tank is fed to a granular activated carbon (GAC)feed tank via a total organic carbon (TOC) controller. If an amount ofTOC, as measured by the TOC controller, in the output of the AOP tankexceeds a predetermined value, an output of the GAC feed tank isrecirculated into the AOP tank. If the amount of TOC, as measured by theTOC controller, in the output of the AOP tank is below the predeterminedvalue, the output of the GAC feed tank is fed into a second granularactivated carbon (GAC) column. The output of the second GAC column isfed to a third GAC column. In another embodiment, the output of thethird GAC column is filtered by using bag filters with 1 μm mesh togenerate the ultra-pure water output.

In another embodiment, the two streams of EDI reject from the EDI moduleare circulated to the ion exchange feed tank. In addition, the NFpermeate from the NF module is circulated to the ion exchange feed tank.

In another embodiment, the concentrate waste is treated in the chemicaldewatering reactor. The method further includes feeding the concentratewaste from the manufacturing operations into a concentrate waste tank.The NF reject is also fed to the concentrate waste tank whenconductivity in the ion exchange feed tank exceeds a predeterminedthreshold. The method further includes feeding an output of theconcentrate waste tank into the chemical dewatering reactor. In anotherembodiment, a chemical process is performed on the output of theconcentrate waste tank within the chemical dewatering reactor togenerate a sludge and a decant. The sludge from the chemical dewateringreactor is fed into a filter or screw type press to generate the firstpart of the solid waste output, and a permeate.

In one embodiment, treating the output of the chemical dewateringreactor and the film and mask developer waste in the distillation feedtank includes feeding the film and mask developer waste from themanufacturing operations into the distillation feed tank. The methodfurther includes feeding the decant from the chemical dewatering reactorand the permeate from the filter or screw type press into thedistillation feed tank. In another embodiment, the method includes pHbalancing of the pH of a mixture of the film and mask developer waste,the decant, and the permeate within the distillation feed tank.

In one embodiment, treating the output of the chemical dewateringreactor and the film and mask developer waste in the thermal vacuumdewatering tank and the crystallization tank includes feeding an outputof the distillation feed tank into a first thermal vacuum dewateringtank. The output of the distillation feed tank is heated within thefirst thermal vacuum dewatering tank in a partial vacuum to generate afirst stage distillate and a densified concentrate wherein the firststage distillate forms a first part of the distilled water output. Inanother embodiment, the method further includes feeding the densifiedconcentrate from the first thermal vacuum dewatering tank to thecrystallization tank. The densified concentrate is crystallized usingchill water within a crystallizer of the crystallization tank togenerate the second part of the solid waste output and a processedliquid. In another embodiment, the processed liquid is fed from thecrystallizer into a second thermal vacuum dewatering tank via a finaldewatering feed tank. The processed liquid is dewatered within thesecond thermal vacuum dewatering tank to generate a second stagedistillate and the third part of the solid waste output, wherein thesecond stage distillate forms a second part of the distilled wateroutput.

In another embodiment, the first stage distillate is circulated from thefirst thermal vacuum dewatering tank to the ion exchange feed tank. Inaddition, the second stage distillate is circulated from the secondthermal vacuum dewatering tank to the ion exchange feed tank.

According to another embodiment a zero liquid discharge recycling systemfor treating waste generated from manufacturing operations is provided.These manufacturing operations include at least one of Printed CircuitBoards Fabrication (PCB FAB), General Metal Finishing (GMF),semiconductors manufacturing, chemical milling, and Physical VaporDeposition (PVD) manufacturing. The waste includes rinse-water waste,concentrate waste, and film and mask developer waste. The zero liquiddischarge recycling system described herein relies on the use ofmultiple technologies, collectively and separately, to achieve zeroliquid discharge. These technologies include an ion exchange feed tank,a first granular activated carbon (GAC) column, a copper selective ionexchange column, a membrane-based separation module, and an advancedoxidation process (AOP) tank operative for treating the rinse-waterwaste to generate an ultra-pure water output. In addition, the systemmay include a chemical dewatering reactor operative for treating theconcentrate waste to generate a first part of a solid waste output. Thesystem may include a distillation feed tank, a thermal vacuum dewateringtank, and a crystallization tank for treating an output of the chemicaldewatering reactor and the film and mask developer waste to generate adistilled water output that is treated with the rinse-water waste, and asecond and a third part of the solid waste output.

The ion exchange feed tank includes an ultraviolet light generating lampfor exposing the rinse-water waste to ultraviolet light within the ionexchange feed tank. The system may also include a centrifugal filter andbag filters with 10 μm meshes to remove suspended solids from an outputof the ion exchange feed tank.

The first granular activated carbon (GAC) column removes non-polarorganic compounds, halogens, and water-insoluble substances from theoutput of the ion exchange feed tank after the removal of the suspendedsolids.

The copper selective ion exchange column includes a copper selective ionexchanger that binds copper ions present in an output of the firstgranular activated carbon (GAC) column.

The system further includes a low conductivity water tank to expose anoutput of the copper selective ion exchange column to ultraviolet light.

The membrane-based separation module comprises three reverse osmosismodules. A first reverse osmosis (RO) module is used to separate anoutput of the low conductivity water tank into an RO1 permeate and anRO1 reject. A second RO module is used to separate the RO1 permeate intoan RO2 permeate and an RO2 reject. The first RO module is further usedto separate the RO2 reject along with the output of the low conductivitywater tank into the RO1 permeate and the RO1 reject. A third RO moduleis used to separate the RO1 reject into an RO3 permeate and an RO3reject. An electrodeionization (EDI) module is used to separate the RO2permeate into an EDI permeate and two streams of EDI reject. Ananofiltration (NF) module is used to separate the RO3 reject into an NFpermeate and an NF reject.

The advanced oxidation process (AOP) tank is used to expose the EDIpermeate to ozone and ultraviolet light, wherein the system may furtherinclude a second and a third granular activated carbon (GAC) column andbag filters with 1 μm mesh to generate ultra-pure water output. In otherexamples, the bag filters comprise meshes having size ranging between0.1-10 μm.

The system may include conduits to circulate the two streams of EDIreject from the EDI module, the NF permeate from the NF module and theRO3 permeate from the third RO module to the ion exchange feed tank. Thesystem may further include conduits to circulate the NF reject from theNF module to the ion exchange feed tank when conductivity in the ionexchange feed tank is below a predetermined threshold.

The chemical dewatering reactor is used to chemically treat theconcentrate waste, a backwash from the copper selective ion exchangecolumn and the NF reject, when conductivity in the ion exchange feedtank exceeds a predetermined threshold, to generate a sludge and adecant. The system includes a filter or screw type press used togenerate the first part of the solid waste output and a permeate fromthe sludge.

The distillation feed tank is used to pH balance the pH of a mixture ofthe film and mask developer waste, the decant, and the permeate.

The thermal vacuum dewatering tank and the crystallization tank are usedto heat an output of the distillation feed tank within a first thermalvacuum dewatering tank in a partial vacuum to generate a first stagedistillate and a densified concentrate. The first stage distillate formsa first part of the distilled water output, crystallizing the densifiedconcentrate using chill water within a crystallizer of thecrystallization tank to generate the second part of the solid wasteoutput and a processed liquid. The processed liquid is dewatered withina second thermal vacuum dewatering tank to generate a second stagedistillate and the third part of the solid waste output. The secondstage distillate forms a second part of the distilled water output.

The embodied system further includes conduits operative for circulatingthe first stage distillate from the first thermal vacuum dewatering tankand the second stage distillate from the second thermal vacuumdewatering tank to the ion exchange feed tank.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 schematically shows an exemplary system 10 for a zero liquiddischarge recycling method for treating waste generated frommanufacturing operations, and a simplified illustration of liquid flowtherewithin.

DETAILED DESCRIPTION OF THE INVENTION

Embodiments detailed herein are best understood by reference to theFIGURE and descriptions set forth herein. All the aspects of theembodiments described herein will be better appreciated and understoodwhen considered in conjunction with the following description and theaccompanying FIGURE. It should be understood, however, that thefollowing descriptions, while indicating preferred embodiments andnumerous specific details thereof, are given by way of illustration andnot of limitation. Many changes and modifications may be made within thescope of the embodiments herein without departing from the spirit andscope thereof, and the embodiments herein include all suchmodifications.

This description is generally drawn, inter alia, to methods and systemsimplemented for the zero liquid discharge recycling of waste generatedfrom manufacturing operations including Printed Circuit BoardsFabrication (PCB FAB), General Metal Finishing (GMF), semiconductorsmanufacturing, chemical milling, and Physical Vapor Deposition (PVD)manufacturing, the waste including rinse-water waste, concentrate waste,and film and mask developer waste.

The inventor and the description herein strive to revolutionize theconcept of treating waste generated from manufacturing operations toachieve zero liquid discharge.

FIG. 1 schematically shows an exemplary system 10 for implementing amethod for zero liquid discharge recycling treatment of waste generatedfrom manufacturing operations. The manufacturing operations may includePrinted Circuit Boards Fabrication (PCB FAB), General Metal Finishing(GMF), semiconductors manufacturing, chemical milling, and PhysicalVapor Deposition (PVD) manufacturing. The manufacturing operations ofthese methods and processes generate waste which includes a rinse-waterwaste, concentrate waste, and a film and mask developer waste. Thesewastes are treated using different processes utilized by the zero liquiddischarge recycling system 10 to achieve zero liquid discharge.

As shown in FIG. 1, the waste from the manufacturing operations isseparated as rinse-water waste, concentrate waste, and film and maskdeveloper waste. The rinse-water waste generated from the manufacturingoperations is fed to an ion exchange feed tank T-1 via conduit 100. Theion exchange feed tank T-1 contains ultraviolet light generating lamps.The rinse-water waste is exposed to the ultraviolet light within the ionexchange feed tank T-1. The output of the ion exchange feed tank T-1 isfed to the centrifugal filter F-1 via a conduit 102. The centrifugalfilter F-1 removes suspended solids from the output of the ion exchangefeed tank T-1 and an output thereof is fed to bag filters F-2A and F-2Bvia conduit 104. The bag filters F-2A and F-2B remove the suspendedsolids still present in the output of the centrifugal filter F-1.

In some examples, the bag filters F-2A and F-2B include 10 μm meshes toremove the suspended solids from the output of the ion exchange feedtank. In some examples, the system 10 includes a level transmitter (notshown) in the ion exchange feed tank T-1 and pressure and flowtransmitters (not shown) before and after the filters. In some examples,the pressures at this stage range between about 1-10 bar.

After removal of the suspended solids, the output of the bag filtersF-2A and F-2B is fed to a granular activated carbon (GAC) column E-1Avia conduit 106 and to a granular activated carbon (GAC) column E-1B viaconduit 108. In some examples, the granular activated carbon (GAC)column E-1A and granular activated carbon (GAC) column E-1B areimplemented as a single first granular activated carbon (GAC) columnE-1A, E-1B. The granular activated carbon (GAC) columns E-1A and E-1Bcontain an activated carbon which absorbs impurities such as non-polarorganic compounds, halogens, and other water-insoluble substances. Thisresults in the removal of the polar organic compounds, halogens, andother water-insoluble substances from the output of the bag filters F-2Aand F-2B.

In some examples, the granular activated carbon (GAC) columns E-1A andE-1B are equipped with measuring elements such as pressure gauges andmultiparameter controllers to control the conductivity and pH of anoutput of the granular activated carbon (GAC) columns E-1A and E-1B. Insome examples, the pH is maintained between the range of 3-12, thetemperature of the fluid between 15-35° C., and conductivity between 0.1MicroSiemens-5.0 MiliSiemens.

After removing the polar organic compounds, halogens, andwater-insoluble substances, the output of the granular activated carbon(GAC) columns E-1A and E-1B is fed to copper selective ion exchangecolumns E-2A and E-2B via a conduit 110. The copper selective ionexchange columns E-2A and E-2B include a copper selective ion exchangeresin or ion exchanger. The copper selective ion exchange resin withinthe copper selective ion exchange columns E-2A and E-2B binds the copperions present in the output of the granular activated carbon (GAC)columns E-1A and E-1B.

In some examples, the ion exchange columns E-2A and E-2B are equippedwith measuring elements such as pressure gauges and multiparametercontrollers to control the conductivity and pH of the fluid. In someexamples, the pH is maintained between the range of 3-12, thetemperature of the fluid is between 15-35° C., and conductivity isbetween 0.1 MicroSiemens-5.0 MiliSiemens.

According to an embodiment, the copper is selectively removed from usedetchant utilized during the manufacturing process. The used etchant isfed to a copper selective ion exchange columns E-2C via a conduit 114.The copper selective ion exchange resin within the copper selective ionexchange columns E-2C binds copper ions present in the used etchant andgenerates regenerated etchant. The regenerated etchant is fed to aregenerated etchant tank T-4 for re-use via a conduit 116.

Due to continuous ion exchange in the copper exchange columns E-2A, E-2Band E-2C, the ion exchange capability of the copper selective ionexchange resin within the copper selective ion exchange columns E-2A,E-2B and E-2C declines. To restore the original ion exchange capabilityof the copper selective ion exchange columns E-2A, E-2B and E-2C, aregeneration process is carried out. The regeneration process includesrestoring the original ion exchange capacity of the ion exchange bedwithin the copper selective ion exchange columns E-2A, E-2B and E-2C byremoving the copper ions attached during the exchange of counterions andby introducing appropriate mobile ions in their place. The regenerationprocess is achieved by passing a regenerating agent solution through theregenerating bed within the copper selective ion exchange columns E-2A,E-2B and E-2C. In the example illustrated in FIG. 1, the regeneratingagent solution is sulfuric acid. The sulfuric acid is present in an acidtank T-2 and is added to the regenerating bed within the copperselective ion exchange columns E-2A, E-2B and E-2C via conduits 118 and120 and 122 respectively.

The regenerating agent solution helps in restoring the ion exchangecapability of the copper selective ion exchange columns E-2A, E-2B andE-2C. The copper selective ion exchange columns E-2A, E-2B and E-2Cgenerates a sulfuric acid-copper solution as an output which is fed fromthe copper selective ion exchange columns E-2A, E-2B and E-2C viaconduits 124, 126 and 128 respectively to an electrolytic cell E-3. Theelectrolytic cell E-3 functions to perform the copper recovery processon the received sulfuric acid-copper solution input. The receivedsulfuric acid-copper solution undergoes electrowinning to separate purecopper from the sulfuric acid-copper solution. The pure copper generatedby the electrolytic cell E-3 is recycled for usage during manufacturingoperations. Further, the removal of the pure copper from the sulfuricacid-copper solution results in regeneration of the sulfuric acid forsubsequent regenerations. The regenerated sulfuric acid is fed to theacid tank T-2 via a conduit 130 to be used in the regeneration of theion exchange capability of the copper selective ion exchange columnsE-2A, E-2B and E-2C.

The output of the copper selective ion exchange columns E-2A and E-2B isfed to a low conductivity water tank T-5 via a conduit 112 for furthertreatment. The output of the copper selective ion exchange columns E-2Aand E-2B is subsequently exposed to UV light within the low conductivitywater tank T-5. The exposure to UV light protects the liquid in the tankfrom growth of bacteria, algae, and other micro-organisms. The output ofthe low conductivity water tank T-5 is fed to a membrane-basedseparation module. The membrane-based separation module comprisesreverse osmosis (RO) modules E-4, E-5, and E-7, an electrodeionization(EDI) module E-6, and a nanofiltration (NF) module E-8.

The output of the low conductivity water tank T-5 is fed to the firstreverse osmosis (RO1) module E-4 via a conduit 132. The first reverseosmosis (RO1) module E-4 performs reverse osmosis process on the outputof the low conductivity water tank T-5. This process separates theoutput of the low conductivity water tank T-5 into an RO1 permeate andan RO1 reject within the first reverse osmosis (RO1) module E-4. Thefirst reverse osmosis (RO1) module E-4 recovers about 65-85 percent ofthe infeed, i.e., the output of the low conductivity water tank T-5 asthe RO1 permeate. The RO1 permeate is fed to the second reverse osmosis(RO2) module E-5 via a conduit 134.

The RO2 module E-5 performs reverse osmosis on the RO1 permeate toseparate the RO1 permeate into an RO2 permeate and an RO2 reject withinthe RO2 module E-5. The RO2 module E-5 recovers about 65-85 percent ofthe infeed, i.e., the RO1 permeate, as the RO2 permeate. The RO2 rejectis circulated back to the (RO1) module E-4 via conduit 136 and the RO2permeate is fed into the EDI module E-6 via a conduit 138.

The RO2 permeate is separated into an EDI permeate and two streams ofEDI reject within the EDI module E-6. The EDI module E-6 useselectrodeionization to increase resistivity to greater than 10 megaohms. The EDI permeate is fed into an advanced oxidation process (AOP)tank E-9 via a conduit 140, a deionized (DI) water tank T-6 and aconduit 142. The two streams of EDI reject generated from the EDI moduleE-6, i.e., EDI reject 1 and EDI reject 2 are circulated back to the ionexchange feed tank T-1 via conduits 144 and 146, respectively.

The RO1 reject generated by the RO1 module E-4 is fed to third reverseosmosis module (RO3) E-7 via a conduit 148. The RO3 module E-7 performsreverse osmosis on the RO1 reject to separate the RO1 reject into an RO3permeate and an RO3 reject within the RO3 module E-7. The RO3 permeateis circulated back to the ion exchange feed tank T-1 via conduit 150.

The RO3 reject generated by the RO3 module E-7 is fed to nanofiltration(NF) module E-8 via a conduit 152, and is separated into NF permeate andNF reject within the NF module E-8. The NF permeate is circulated backto the ion exchange feed tank T-1 via conduit 154. If the conductivityin the ion exchange feed tank T-1 is below a set value the NF reject iscirculated back to the ion exchange feed tank T-1 via a conduit 156, andif the conductivity in the ion exchange feed tank T-1 is equal to orexceeds the set value the NF reject is fed to the concentrate feed tankT-8 via conduit 158 to be treated along with the concentrate waste. Insome examples the set value for the conductivity in the ion exchangefeed tank T-1 can be 300 μS. For instance, when the conductivity in theion exchange feed tank T-1 is between 300-2000 μS, the system operatesin a normal mode and the NF reject is fed to the concentrate feed tankT-8. When the conductivity in the ion exchange feed tank T-1 is below300 μS, the NF reject is circulated back to the ion exchange feed tankT-1.

In some examples, the membrane-based separation modules are equippedwith measuring elements such as level transmitter in the tank pressuregauges, flow transmitters, pressure transmitters and conductivitytransmitters. In some examples, the pH is maintained between the range3-12, the temperature of the fluid between 15-35° C., and conductivitybetween 0.03 MicroSiemens-5.0 MiliSiemens.

The EDI permeate is exposed to ozone and ultraviolet light withinadvanced oxidation process (AOP) tank E-9. This exposure breaks downlong chain molecules which are not removed during previous stages oftreatment. The output generated by the advanced oxidation process (AOP)tank E-9 is fed into a granular activated carbon (GAC) feed tank T7 viaa conduit 160, which has an inline mounted total organic carbon (TOC)controller E-10. The TOC controller E-10 measures the TOC amount in theoutput of the advanced oxidation process (AOP) tank E-9. If the amountof TOC in the output of the AOP tank E-9 exceeds a predetermined value,the output of the GAC feed tank T-7 is recirculated to the AOP tank E-9via a conduit 162. If the amount of TOC in the output of the AOP tankE-9 is zero or below a predetermined value, the output of the GAC feedtank T-7 is fed into a second granular activated carbon (GAC) columnE-11 via a conduit 164. In some examples, the predetermined value forthe TOC can be 0-2 ppm. In other examples, the predetermined value forthe TOC can be 1-2 ppm. The output of the second granular activatedcarbon (GAC) column E-11 is fed into a third granular activated carbon(GAC) column E-12 via a conduit 166.

The second granular activated carbon (GAC) column E-11 and the thirdgranular activated carbon (GAC) column E-12 capture small, fragmentedmolecules, and an output thereof is fed to bag filters F-3A and F-3B viaconduits 168 and 170 respectively. The bag filters F-3A and F-3B filtersthe output of the third granular activated carbon (GAC) column E-12 togenerate an ultra-pure water output. The ultra-pure water output is sentfor re-use in the manufacturing operations via a conduit 172. Further,the residue generated by the bag filters F-3A and F-3B after filteringthe output of the third granular activated carbon (GAC) column E-12 isrecirculated back to the DI water tank T-6 for further treatment viaconduit 174.

In some examples, the bag filters F-3A and F-3B comprise a 1 μm mesh togenerate the ultra-pure water output. In other examples, the bag filtersF-3A and F-3B comprise meshes having sizes ranging between 0.1-10 μm.

In some examples, the DI water tank T-6 and/or the advanced oxidationprocess (AOP) tank E-9 comprises measuring elements such as leveltransmitters in the tank, pressure gauges, pressure transmitters,conductivity transmitters and flow meters. In some examples, theresistivity of the fluid is maintained between 10-18 mega ohm and totalorganic carbon (TOC) is between 0-800 ppb.

As further shown in FIG. 1, the concentrated waste is treated in achemical dewatering reactor E-13. The concentrated waste generated fromthe manufacturing operations is fed into a concentrate waste tank T-8via a conduit 176. Also, a backwash from the copper selective ionexchange columns E-2A, E-2B, and E-2C is fed to the concentrate wastetank T-8 via conduits 178, 180, and 182, respectively. The NF rejectfrom the nanofiltration (NF) module E-8 is fed to the concentrate wastetank T-8 via the conduit 158. The output of the concentrate waste tankT-8 is fed into the chemical dewatering reactor E-13 via a conduit 184for performing chemical processes on the output of the concentrate wastetank T-8. In the chemical dewatering reactor E-13, the output of theconcentrate waste tank T-8 is discontinuously treated in severalsuccessive chemical treatment steps by taking into consideration therequired reaction times. The chemical treatment steps are performed toadjust the pH of and to remove the total suspended solids (TSS) from theoutput of the concentrate waste tank T-8. The pH is adjusted to drop outsolids from the output of the concentrate waste tank T-8. In someexamples, the pH is adjusted by adding acid and hydroxide solutions,and/or a polymer or flocculent to help settle those solids. The chemicalsteps performed within the chemical dewatering reactor E-13 includeprocesses such as, but not limited to, neutralization (adding acid andhydroxide solutions), precipitation (mixing solvents or changing theirtemperature), coagulation/flocculation (adding a polymer or flocculentto help settle solids), and sedimentation. These chemical processesgenerate a sludge and a decant within the chemical dewatering reactorE-13.

In some examples, the chemical dewatering reactor E-13 also includes alevel transmitter for level controls. If the level within the chemicaldewatering reactor E-13 reaches a high level, the pumps which arefeeding the output of the concentrate waste tank T-8 into the chemicaldewatering reactor E-13 will automatically shut off. The pumping systemcannot be started until minimum low level is reached which ensures thatthe input which is to be treated, i.e. the output of the concentratewaste tank T-8, is enough.

In some examples, the chemical dewatering reactor E-13 comprises a leveltransmitter and pH and ORP (oxidation reduction potential) meters. ThepH adjustment in the chemical dewatering reactor E-13 is between 8-11.

In some examples, the chemical dewatering reactor E-13 is equipped witha mixer which is used to turn on and off the timing intervals todiscontinuously treat the output of the concentrate waste tank T-8 inseveral successive chemical treatment steps by taking into considerationthe required reaction times. The different chemical processes generatethe sludge and the decant within the chemical dewatering reactor E-13.

The sludge from the chemical dewatering reactor E-13 is fed into afilter or screw type press E-14 via a conduit 186 to generate a firstpart of the solid waste output, i.e., a dewatering sludge, and apermeate. The dewatering sludge is transported to a non-metal sludgelandfill via a conduit 188.

The permeate is fed from the filter or screw type press E-14 to adistillation feed tank T-9 via a conduit 190. Also, the film and maskdeveloper waste from the manufacturing operations and the decant fromthe chemical dewatering reactor E-13 are also fed into the distillationfeed tank T-9 via conduits 192 and 194, respectively.

In the distillation feed tank T-9, acidic or caustic solutions are addedto achieve pH balancing of the film and mask developer waste, thedecant, and the permeate within the distillation feed tank T-9. In someexamples, the distillation feed tank T-9 comprises measuring elementssuch as level transmitters and pH controllers.

The output of the distillation feed tank T-9 is fed into a first thermalvacuum dewatering tank E-15 via a conduit 196. The output of thedistillation feed tank T-9 is heated up to a range of 80-95° C. withinthe first thermal vacuum dewatering tank E-15. This process is alsocoupled with a partial vacuum to accelerate the distillation of theoutput of the distillation feed tank T-9 within the first thermal vacuumdewatering tank E-15. In some examples, the heating of the output of thedistillation feed tank T-9 is accomplished via a heat exchange coilcontaining hot water or steam. The heating of the output of thedistillation feed tank T-9 generates a first stage distillate and adensified concentrate wherein the first stage distillate forms a firstpart of the distilled water output. The first part of the distilledwater output is fed to the ion exchange feed tank T-1 via a conduit 198for re-treatment along with the the rinse-water waste.

The densified concentrate from the first thermal vacuum dewatering tankE-15 is fed to a crystallization tank T-10 via a conduit 200. Thedensified concentrate is taken from an initial density of between1.00-1.11 g/ml and raised until a density of 1.3-1.5 g/ml is achieved.The densified concentrate is then fed to a crystallizer E-16 via aconduit 202. The crystallizer E-16 relies on chill water to cool thesolution and remove the precipitant solids as they form. Thecrystallizer E-16 generates a second part of the solid waste output anda processed liquid.

The processed liquid is fed from the crystallizer E-16 to a finaldewatering feed tank T-11 via conduit 204 and is further fed to a secondthermal vacuum dewatering tank E-17 via a conduit 206. The processedliquid is dewatered within the second thermal vacuum dewatering tankE-17 to generate a second stage distillate and a third part of the solidwaste output wherein the second stage distillate forms a second part ofthe distilled water output. The dewatering within the second thermalvacuum dewatering tank E-17 relies on a jacketed hot water heatingsystem and contains a rotating scraper inside to dewater the processedliquid into the third part of the solid waste output. The second part ofsolid waste output generated by the crystallizer E-16 and the third partof solid waste output generated by the second thermal vacuum dewateringtank E-17 are sent to the non-metal sludge for landfill via conduits 208and 210 respectively.

The first stage distillate from the first thermal vacuum dewatering tankE-15 and the second stage distillate from the second thermal vacuumdewatering tank E-17 are circulated to the ion exchange feed tank T-1via conduits 198 and 212 respectively. Therefore, the zero liquiddischarge recycling of waste generated from manufacturing operations isachieved.

All ranges cited herein shall be considered inclusive unless otherwiseindicated. Although the present description has been presented in termsof certain preferred embodiments, various features of separateembodiments can be combined to form additional embodiments not expresslydescribed. Moreover, other embodiments apparent to those of ordinaryskill in the art after reading this disclosure are also within the scopeof this description. Furthermore, not all of the features, aspects andadvantages are necessarily required to practice the present invention.Thus, while the above detailed description has shown, described, andpointed out novel features as applied to various embodiments, it will beunderstood that various omissions, substitutions, and changes in theform and details of the apparatus or process illustrated may be made bythose of ordinary skill in the technology without departing from thespirit of the invention. The embodiments described above are to beconsidered in all respects as illustrative only and not restrictive inany manner. The scope of the invention is indicated by the followingclaims, informed by the above descriptions.

What is claimed is:
 1. A method for generating a solid wastecomposition, the composition comprising a first part of a solid wasteoutput, a second part of a solid waste output, and a third part of asolid waste output, wherein the composition is generated by treating atleast one of rinse-water waste, concentrate waste, and film and maskdeveloper waste using a plurality of modules comprising a chemicaldewatering reactor, a distillation feed tank, a first thermal vacuumdewatering tank, a crystallization tank, a final dewatering feed tank,and a second thermal vacuum dewatering tank.
 2. The method of claim 1,wherein the method is used in a zero liquid discharge recycling systemfor treating waste generated from a plurality of manufacturingoperations.
 3. The method of claim 1, wherein the first part of thesolid waste is generated by the concentrate waste that has passedthrough the chemical dewatering reactor.
 4. The method of claim 1,wherein a permeate is generated by the concentrate waste that has passedthrough the chemical dewatering reactor.
 5. The method of claim 4,wherein the second part of the solid waste and a processed liquid aregenerated by film and mask developer waste and the permeate generated bythe chemical dewatering reactor that has passed through the distillationfeed tank, the first thermal vacuum dewatering tank, the crystallizationtank, and a crystallizer.
 6. The method of claim 5, wherein theprocessed liquid is fed to the final dewatering feed tank and the secondthermal vacuum dewatering tank to generate the third part of the solidwaste output.
 7. The method of claim 5, wherein the first thermal vacuumdewatering tank generates a first part of distilled water output whichis treated along with the rinse-water waste.
 8. The method of claim 6,wherein the second thermal vacuum dewatering tank generates a secondpart of distilled water output which is treated along with the rinsewater waste.
 9. The method of claim 1, wherein the second part of thesolid waste output has a density of 1.3 g/ml to 1.5 g/ml.
 10. The methodof claim 2, wherein the zero liquid discharge recycling system comprisesan ion exchange feed tank, a first granular activated carbon (GAC)column, a copper selective ion exchange column, a membrane-basedseparation module, and an advanced oxidation process (AOP) tank fortreating the rinse-water waste.
 11. The method of claim 2, wherein theplurality of manufacturing operations comprises at least one of PrintedCircuit Boards Fabrication (PCB FAB), General Metal Finishing (GMF),semiconductors manufacturing, chemical milling, and Physical VaporDeposition (PVD) manufacturing.
 12. The method of claim 1, wherein thecomposition comprises a non-metal dewatered sludge for landfill.
 13. Amethod for generating ultra-pure water by treating at least one ofrinse-water waste, concentrate waste, and film and mask developer wastein a zero liquid discharge recycling system, wherein the zero liquiddischarge recycling system comprises an ion exchange feed tank, a firstgranular activated carbon (GAC) column, a copper selective ion exchangecolumn, a low conductivity water tank, a membrane-based separationmodule, and an advanced oxidation process (AOP) tank.
 14. The method ofclaim 13, wherein an output of the advanced oxidation process (AOP) tankis passed through a total organic carbon (TOC) controller, wherein whenan amount of TOC, as measured by the TOC controller, in the output ofthe AOP tank exceeds a predetermined value of the TOC, an output of theGAC feed tank is recirculated into the AOP tank, and when the amount ofTOC, as measured by the TOC controller, in the output of the AOP tank isbelow the predetermined value of the TOC, the output of the GAC feedtank is processed to generate the ultra-pure water.
 15. The method ofclaim 14, wherein the predetermined value of the TOC is 1-2 ppm.
 16. Themethod of claim 13, wherein the method is used in comprising the zeroliquid discharge recycling system for treating waste generated frommanufacturing operations.
 17. The method of claim 16, wherein themanufacturing operations comprise at least one of Printed Circuit BoardsFabrication (PCB FAB), General Metal Finishing (GMF), semiconductorsmanufacturing, chemical milling, and Physical Vapor Deposition (PVD)manufacturing.
 18. The method of claim 13, wherein the generatedultra-pure water is re-used in the manufacturing operations.
 19. Themethod of claim 13, wherein the zero liquid discharge recycling systemcomprises a chemical dewatering reactor, a distillation feed tank, afirst thermal vacuum dewatering tank, a crystallization tank, acrystallizer, a final dewatering feed tank, and a second thermal vacuumdewatering tank to generate a solid waste composition for landfill.